The Nano-Micro-Lithography Symposium is taking place online again. This symposium features technical experts and customers from Nanoscribe, micro resist technology, GenISys and Raith who will present and describe the latest technologies and products for Nano-Micro-Lithography, specifically Optical, Ion and Electron Beam Lithography. Several users of these products provide detailed insights into projects and describe their experience with various products, technologies and applications.
Using gather.town as an online venue offers the possibility to attend presentations in conference rooms and meet companies, as well as receive individual advice. Take the chance to get ideas for your innovation projects, meet Nanoscribe and discuss your goals in 3D Microfabrication with us.
Find more detailed information about the entire event in the agenda below.
| 14:00 | Welcome & Introduction Nezih Ünal, GenISys & Helge Mischke, micro resist technology |
| 14:10 | Keynote Multi-material 3D printing using 2-photon laser direct writing Dr. Robert Kirchner, TU Dresden |
| 14:45 | Micro- and nanostructuring of hybridpolymers for various applications Dr. Maria Russew, micro resist technology |
| 15:10 | Coffee Breakt & Online Job fair |
| 15:50 | Challenges for integration of optical elements Dr. Christian Helke, Fraunhofer ENAS |
| 16:15 | Vertical sidewalls in thick epoxy resists – a challenge for laser-based direct write lithography Dr. Muhammad Refatul Haq, Paul Scherrer Institut |
| 16:40 | Randomized Fresnel Zone Plates for EUV Free-electron lasers fabricated with ion beam lithography Dr. Kahraman Keskinbora, Raith GmbH, MIT (USA) |
| 17:05 | End of Day 1 |
| 09:00 | Welcome & Introduction Nezih Ünal, GenISys & Helge Mischke, micro resist technology |
| 09:10 | Keynote The era of two-photon polymerized engineered microenvironments, a promising tool for cell mechanobiology and in-vitro disease/treatment modelling Prof. Angelo Accardo, Delft University of Technology |
| 09:45 | ProSEM Metrology Software: New Automation Features and Improvements Dr. Sven Bauerdick, GenISys |
| 10:10 | 2.5D and 3D microfabrication with nanoprecision alignment and tilt compensation Dr. Jochen Zimmer, Nanoscribe |
| 10:35 | Coffee Breakt & Online Job fair |
| 11:15 | 3D-coupling interfaces for photonic quantum technologies Prof. Wolfram Pernice, University of Münster & University of Heidelberg |
| 11:40 | PICOMASTER laser lithography systems: sub 300nm exposure capabilities Viacheslav Vlasenko, Raith GmbH |
| 12:05 | Discussion and Networking |
| 13:00 | End of Day 1 |
