Event
October 19 – 20, 2022

Nano-Micro-Lithography Symposium

Nano-Micro-Lithography Symposium 2022

Joint Symposium on Laser, Optical, Ion and Electron Beam Lithography

The Nano-Micro-Lithography Symposium is taking place online again. This symposium features technical experts and customers from Nanoscribe, micro resist technology, GenISys and Raith who will present and describe the latest technologies and products for Nano-Micro-Lithography, specifically Optical, Ion and Electron Beam Lithography. Several users of these products provide detailed insights into projects and describe their experience with various products, technologies and applications.

Using gather.town as an online venue offers the possibility to attend presentations in conference rooms and meet companies, as well as receive individual advice. Take the chance to get ideas for your innovation projects, meet Nanoscribe and discuss your goals in 3D Microfabrication with us.

Find more detailed information about the entire event in the agenda below.
 

October 19th 14 - 17:05 (CEST)
14:00 Welcome & Introduction
Nezih Ünal, GenISys & Helge Mischke, micro resist technology
14:10 Keynote
Multi-material 3D printing using 2-photon laser direct writing
Dr. Robert Kirchner, TU Dresden
14:45 Micro- and nanostructuring of hybridpolymers for various applications
Dr. Maria Russew, micro resist technology
15:10 Coffee Breakt & Online Job fair
15:50 Challenges for integration of optical elements
Dr. Christian Helke, Fraunhofer ENAS
16:15 Vertical sidewalls in thick epoxy resists – a challenge for laser-based direct write lithography
Dr. Muhammad Refatul Haq, Paul Scherrer Institut
16:40 Randomized Fresnel Zone Plates for EUV Free-electron lasers fabricated with ion beam lithography
Dr. Kahraman Keskinbora, Raith GmbH, MIT (USA)
17:05 End of Day 1
October 20th 09:00 - 13:00 (CEST)
09:00 Welcome & Introduction
Nezih Ünal, GenISys & Helge Mischke, micro resist technology
09:10 Keynote
The era of two-photon polymerized engineered microenvironments, a promising tool for cell mechanobiology and in-vitro disease/treatment modelling
Prof. Angelo Accardo, Delft University of Technology
09:45 ProSEM Metrology Software: New Automation Features and Improvements
Dr. Sven Bauerdick, GenISys
10:10 2.5D and 3D microfabrication with nanoprecision alignment and tilt compensation
Dr. Jochen Zimmer, Nanoscribe
10:35 Coffee Breakt & Online Job fair
11:15 3D-coupling interfaces for photonic quantum technologies
Prof. Wolfram Pernice, University of Münster & University of Heidelberg
11:40 PICOMASTER laser lithography systems: sub 300nm exposure capabilities
Viacheslav Vlasenko, Raith GmbH
12:05 Discussion and Networking
13:00 End of Day 1
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