June 25, 2019
Innovation Award for Quantum X
At the LASER World of Photonics in Munich, we received the Innovation Award for the most innovative product for our brand-new maskless lithography system Quantum X. The award is sponsored by the trade fair and the British specialist publisher Europa Science. It recognizes the outstanding performance of the device designed for the industrial fabrication of refractive and diffractive microoptics. The judges are convinced that Nanoscribe can open a new chapter in microfabrication with this innovation.
"We are delighted to hold the Innovation Award in our hands today," said Martin Hermatschweiler, CEO of Nanoscribe, after the award ceremony. "After a very intensive technical development phase, this is a great recognition for our team and for the outstanding performance of the Quantum X," said Hermatschweiler.
The heart of this maskless lithography system is a completely new printing technology:
Nanoscribe's patent pending Two-Photon Grayscale Lithography (2GL) is being used in Quantum X for the first time. It combines the extraordinary performance of grayscale lithography with the precision and flexibility of Two-Photon Polymerization in an industrial form factor. The device is characterized by high printing speeds, maximum design freedom and high precision, which is of utmost importance for the additive production of complex structures requiring excellent shape accuracy and extremely smooth surfaces. Fast and precise additive manufacturing processes drastically shorten the design iteration cycles, the structures can be used as prototypes as well as masters for replication in industrial processes.