Multi-level diffractive optical elements
Two-Photon Grayscale Lithography enables the fabrication of multi-level diffractive optical elements (DOE) with truly outstanding shape accuracy in one printing step. The nanostructured surfaces meet the high lateral and axial submicron resolution needed in DOEs.
Nanostructured DOEs with excellent shape accuracy
The classical fabrication of diffractive optical elements (DOEs) was quite time-consuming and costly owing to multiple lithographic, etching and alignment processes. With additive microfabrication multi-level DOEs can be fabricated in one printing step, either as prototypes for direct use or as masters for tooling in volume production.
For the fabrication of DOEs we recommend Nanoscribe Quantum X. This system offers a maskless lithography solution, meeting the high lateral and axial resolution needed in DOEs. With the use of Two-Photon Grayscale Lithography (2GL ®), Quantum X directly fabricates multi-level diffractive optical elements in a single layer. Up to 4,096-level designs can be processed into discrete or quasi-continuous topographies in a cost-effective process.
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