Wafer-scale production through 3D direct printing
Direct printing of 2.5D and 3D structures using high-performance 3D printing technologies such as 3D printing by 2GL® enables low-to-high volume production of precision parts with submicron features. Take advantage of wafer-scale production, effortless batch-level customization, and industrial-scale manufacturing throughput.
Maximize your productivity
with proprietary technologies
Direct 3D printing at the wafer scale opens up new possibilities for industrial production of parts with submicron features and superior surface quality for photonics, microoptics, micromechanics, MEMS and MOEMS. Take advantage of our innovative Two-Photon Grayscale Lithography (2GL®) - the most powerful high-resolution additive manufacturing technology with feature size control down to 100 nm. Streamline the production of high-precision structures on wafers up to 8 inches, enabling scalable batch production without the need for costly traditional production lines.
Speed up your nano- and microfabrication
Scientific microfabrication
- Industry-proven upright platform for wafer-scale batch processing and
Dip-in-Laser Lithography (DiLL) - 200 typical mesoscale structures printable overnight
- Print volumes up to 30 cm³ in a single run with the XLF Print Set
- 2GL® Grayscale Lithography for rapid and accurate surface patterning
Industrial mastering
- Two-Photon Grayscale Lithography 2GL® for prototyping and mastering by high-speed single voxel tuning
- Up to 100 times higher throughput for 2.5D designs
- Industry-proven upright platform for wafer-scale batch processing
- Tilt compensation for smooth surfaces and truly seamless structures with 2GL® stitching
Industrial manufacturing
- 3D printing by 2GL® Two-Photon Grayscale Lithography providing superior quality at unrivaled speed
- Up to 60 times higher throughput than classical 2PP-based 3D printing
- Aligned 2-Photon Lithography A2PL® for nanoprecision alignment on optical fibers and photonic chips
- 3D alignment detection accuracy and feature size control down to 100 nm
Dr. Lucas Meza, Assistant Professor, University of Washington
Testing the Quantum X system at Sandia's CINT facility was eye-opening. The print time of 24 hours for each structure with Photonic Professional GT has been cut to 13 minutes and the quality improved.
Quantum X systems
boost your throughput up to 100 times
Choose the appropriate 3D printer for you
Designed as a versatile solution for nano- and microfabrication, the Quantum X platform offers unmatched configurability and expandability to meet diverse industrial and research needs. Its modular architecture allows users to tailor the system with application-specific configurations. The system can automatically dispense print material on the spot and process silica substrates as well as silicon wafers up to 8 inches. In addition, it can 3D print structures on complex, prefabricated substrates that are aligned with nanometer precision. Future-proof and upgradeable, the platform supports evolving needs and ensures flexibility for new materials, advanced processes, and emerging manufacturing challenges.
Choose and customize your high-throughput Quantum X system to meet your specific needs.
Industrial manufacturing
Quantum X align
- Upright system with automatic dispensing for wafer-scale batch processing
- Easily optain superior print quality at unrivaled speed with
3D printing by 2GL® - Fiducial and 3D topography detection for nanometer 3D alignment on chips and fibers
Quantum X
- Upright system with automatic dispensing for wafer-scale batch processing
- High-performance grayscale printing of 2.5D topographies by single voxel tuning with 2GL®
- Automatic calibration routines for submicron shape accuracy