Nano-Micro-Lithography Symposium
Joint Symposium on 3D Laser, Optical, Ion and Electron Beam Lithography
Join us at the 9th Nano-Micro-Lithography Symposium! The symposium 2025 will be held as an in-person event at the TU Eindhoven in the Netherlands. This gives us the opportunity to have a look at different lithography systems in a real lab context in one of Europe's top laboratories.
The symposium will feature an exciting mix of topics related to 3D laser, light, ion and electron beam lithography. Two high-level keynotes will highlight the prospects and technical potential of nano-micro lithography. Technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology and GenISys will present and describe the latest technologies and applications for nano-micro lithography. Several users of these products will provide detailed project insights and describe their experiences with various products, technologies and applications.
Nanoscribe will highlight the Quantum X align, equipped with Aligned 2-Photon Lithography A2PL® for nanoprecision alignment on optical fibers and photonic chips and using 3D printing by 2GL® for microoptics manufacturing and photonics packaging, improving both quality and speed.
March 12th 13:30 - 18:45 (CET)
| 13:00 | Welcome & Introduction Olga Ohletz, GenISys & Wilbert Rooijakkers, TUe Nanolab |
| 13:55 | Keynote Lithography-enabled microfluidic chip technology Regina Luttge, TU Eindhoven |
| 14:40 | Aligned 2-Photon Lithograpy A2PL® for photonic integrated circuits Jochen Zimmer, Nanoscribe |
| 15:05 | Coffee Break & Cleanroom tours |
| 16:40 | 2PP-based laser direct writing of interfacing microoptical components for short-range optical interconnects Koen Vanmol, VU Brussel |
| 17:05 | Advanced SEM Metrology with ProSEM and InSPEC Sven Bauerdick, GenISys |
| 17:30 | Process Workshop, discussion and snacks @Bar Zwarte Doos |
| 18:45 | End of Day 1 |
March 13th 09:00 - 14:00 (CET)
| 09:00 | Welcome & Introduction Olga Ohletz, GenISys |
| 09:05 | Keynote Frontiers in lithography with photonic integration Kevin Williams, TU Eindhoven |
| 09:50 | Photochemicals in applied micro- and nanomanufacturing Jan Erjawetz, XRnanotech |
| 10:15 | tbd Nils Weimann University Duisburg-Essen |
| 10:40 | Coffee Break & discussion |
| 11:20 | Additive Processes in Semicon Manufacturing: The Potential of Inkjet Technology Kai Keller, Notion Systems |
| 11:45 | The Transitioning of 3D Microfabrication of Microfluidic Biosensors: From E-Beam to Laser-Beam Greyscale Lithography Peng Tian, Paul Scherrer Institute PSI |
| 12:10 | Innovative photoresists & photopolymers enabling advanced manufacture of photonic and micro-optical applications Anja Voigt micro resist technology |
| 12:35 | Grayscale exposure challenges using direct-write laser exposure on ultra-thick photosensitive positive resist Timo Oberbiermann, Heidelberg Instruments Mikrotechnik |
| 13:00 | Coffee & discussion |
| 14:00 | End of Day 2 |