Nano-Micro-Lithography Symposium 2027
Combining lithography and direct-write technologies opens up new possibilities in micro- and nanofabrication. The Nano-Micro-Lithography Symposium 2027 (NMLS) explores how these technologies, advanced materials, and process optimization support applications in photonics, micro-optics, semiconductors, advanced packaging, MEMS, sensors, and emerging quantum technologies.
NMLS 2027 will take place on February 17–18, 2027, at IMS CHIPS – Institut für Mikroelektronik in Stuttgart, Germany. The institute connects microelectronics and nanotechnology research with industrial applications, providing a fitting setting for discussions on translating fabrication methods into practical manufacturing workflows. A guided cleanroom tour will offer participants insights into the host facility.
Jointly organized by Nanoscribe, Heidelberg Instruments, GenISys, micro resist technology, and Notion Systems, the symposium brings together researchers, engineers, and industry professionals. Expert presentations, user case studies, and technology updates will cover 2D, 2.5D, and 3D fabrication strategies, with opportunities to exchange ideas and discuss challenges in development, prototyping, and production.
Join us at NMLS 2027 and secure your place! Join us at IMS CHIPS in Stuttgart. Participation is free of charge, but places are limited. Register now through the event website of our partner Heidelberg Instruments.