In order to match this, Nanoscribe has recently added with Quantum X a completely new developed maskless lithography system to its portfolio. Quantum X is the first thoroughbred industrial device to benefit from patent-pending Two-Photon Grayscale Lithography (2GL) and has been specially designed for the production of challenging microoptical components. The 2GL additive manufacturing process combines the exceptional performance of grayscale lithography with the precision and flexibility of Nanoscribe's continuously evolving Two-Photon Polymerization (2PP). "With Quantum X, we provide users with a highly efficient and extremely precise manufacturing process that overcomes previous limitations in design freedom, precision, and throughput," explains Hermatschweiler.
This drastically shortens design iteration cycles for functional prototypes making the entire manufacturing process more time and cost-effective. Especially for the production of refractive and diffractive microoptical components, which are needed in the fields of augmented reality, sensor technology as well as for information and communication technology, these benefits are of particular interest. The additively produced microstructured surfaces are either used directly or integrated as masters into the process chain of a molding series production.
The Nanoscribe team is ready for the start of its US subsidiary.
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