Karlsruhe / Tokyo-Kanagawa. The KEIO University, one of Japan’s most prestigious private university is the first customer using Nanoscribe´s latest 3D printer model Photonic Professional GT2. The installation at the Center for Research, Faculty of Science and Technology will open up completely new opportunities in many fields of applications such as mechanical, electrical, chemical and life sciences.
Successful installation of the first Photonic Professional GT2 at KEIO University in Japan
“Both, the School of Medicine and the Faculty of Science and Technology, will have access to this powerful microfabrication tool”, Mr. Tomoaki Mitani, manager at Central Service Facilities for Research, explained after the successful installation. The range of possible applications extends from the printing of microchannels for electrochemical sensors to the development of novel optical elements and tissue engineering research in 3D cultures.
Nanoscribe´s CEO Martin Hermatschweiler is pleased that users at KEIO can now realize pioneering ideas that were beyond their reach before. Nowadays, more than 180 Nanoscribe systems around the globe are used for various applications in science and industry. “And our user community is steadily growing due to a large number of multi-user facilities”, Hermatschweiler underlines.
The first installation of a Photonic Professional GT2 in Japan could be considered a journey back to the starting point of the technology of two-photon polymerization (2PP) which is the technological base of Nanoscribe’s 3D printers. In 1997 Professor Satoshi Kawata provided the experimental proof of two-photon polymerization in Japan. For more than ten years, Nanoscribe utilizes 2PP’s strength to expose photoresists with extreme focus and highest resolution for the direct fabrication of nano- and microstructures that are otherwise impossible to produce.
Relaunched in December 2018, the model Photonic Professional GT2 pushes the boundaries of nano- and microfabrication offering new solutions for additive manufacturing and maskless lithography. Thanks to optimized hardware and software components as well as new printing materials specially developed for larger volumes, high-resolution microstructures up to a height of 8 mm can now be produced for the first time. While Nanoscribe devices have always been optimally suited to the additive production of the finest structures, objects with submicrometer details from typically 160 nanometers up to the millimeter range on a printing area of up to 100x100 mm² can now be produced in a very short time.
Img. 1: LTR: Prof. Dr. Kotaro Oka, Dep. of Biosciences and Informatics / Prof. Dr. Keiya Shirahama, Faculty of Science and Technology / Ryosuke Terada, Central Service Facilities for Research / Hayato Tsuruta, Japan Laser Corp. / Tomoaki Mitani, Central Service Facilities for Research
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