July 09, 2019
Stanford University hosts Advanced Lithography Symposium 2019
On Friday, July 12, the NNCI/nano@stanford hosts the third edition of the symposium dedicated to advanced lithography. Technical experts from Raith, SwissLitho, GenISys, Eulitha, Heidelberg Instruments and Nanoscribe present the latest lithography technologies in nano- and microfabrication.
NNCI/nano@stanford is a network of open-access facilities providing state-of-the-art instrumentation for internal and external users in academia, industry and governmental labs. It has world-leading expertise in nanoscience and nanotechnology.
Join the symposium and take the chance to get insights into cutting-edge methods for the fabrication of planar as well as 2.5D and truly 3D structures and materials in high resolution.