Nanoscribe Quantum X

Quantum X

Nanoscribe Quantum X is the world's first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics and surface patterning

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Two-Photon Grayscale Lithography (2GL®)
for prototyping and mastering

2.5D grayscale lithography 2GL

High-performance additive manufacturing of 2.5D topographies by single voxel tuning with 2GL ®

Wafer-scale batch processing

Small series production on wafers up to 6” and fully addressable 25 cm² print field

Industrial manufacturing

User-friendly software and automatic calibration routines for submicron shape accuracy

Industrial manufacturing with
Two-Photon Grayscale Lithography

The world’s first Two-Photon Grayscale Lithography (2GL ®) system combines the extraordinary performance of grayscale lithography with the precision and flexibility of Nanoscribe’s pioneering Two-Photon Polymerization (2PP) technology. Quantum X, as maskless lithography system, is the optimal tool for industrial manufacturing of 2.5D freeform microoptics, microlens arrays and multi-level diffractive optical elements.

Our Quantum X system

Industrial performance.

Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field. Discrete and accurate steps as well as essentially continuous topographies can be printed on up to six-inch wafer substrates without the need for additional lithography steps or mask fabrication, thanks to Two-Photon Grayscale Lithography (2GL). The substantial design freedom of additive manufacturing by 2GL facilitates microfabrication and enables various industrial manufacturing tasks.

Industrial mastering.

Quantum X is designed for rapid prototyping and mastering in industrial manufacturing and replication processes. With the performance of Two-Photon Grayscale Lithography, this maskless lithography system redefines the fabrication of freeform microoptics, microlens arrays and multi-level diffractive optical elements.

Industrial standards.

Control your print job via the device's integrated touchscreen. Keep an eye on your Two-Photon Grayscale Lithography system even from the office and in multi-system or multi-user configurations via nanoConnectX. And benefit from industrial standards and time-efficient wafer-scale batch production for outstanding industrial manufacturing.


Technical features in brief

  • Additive manufacturing by Two-Photon Grayscale Lithography with highest precision and submicron shape accuracy
  • Complete and ultrafast single voxel size control for optical-grade, smooth surfaces
  • High-performance microfabrication with proprietary galvo scanning technology
  • Industrial platform for wafer-scale fabrication and small series production 
  • Touchscreen and remote-control interfaces for a straightforward and consistent workflow


Printing processes and range of scales

  • Two-Photon Grayscale Lithography (2GL ®) for stunningly rapid and accurate surface patterning
  • Single and multi-layer support with 4,000 gray levels each
  • Nanoscale printing – feature size control in all spatial directions down to 100 nanometers
  • Microscale printing – with typical dimensions from 50 to 700 micrometers
  • Mesoscale printing – with dimensions up to 25 cm²

Be ready for exceptional optical quality

Two-Photon Grayscale Lithography (2GL®) uses high-frequency synchronization of laser beam modulation and high-speed galvo mirrors for single voxel tuning, enabling outstanding microfabrication features and structures in optical quality:

Seamless structures with 2GL stitching

Quantum X uses a high-precision positioning unit and self-calibration routines to print with excellent accuracy when stitching adjacent print fields together to fabricate larger structures. 2GL enables the dynamic adjustment of laser dose at the print field boundaries to compensate chemically induced shrinkage of the photopolymer and positioning imperfections. With this combination of features, truly seamless structures can be printed over an area of several cm², eliminating all stitching marks.

Tilt compensation for smooth surfaces

Quantum X applies the automatic interface finder to detect the surface of the substrate with nanometer precision and to anchor structures reliably on the surface. It measures the substrate tilt by operating the autofocus on a tight grid of points. The tilt of the substrate is determined by processing dedicated signals while the stage is moved up and down. By using 2GL combined with the automatic tilt compensation, deviations can be equalized between individual print blocks to achieve smooth surfaces without stitching seams or staircase effects on tilted substrates.


Do you want to check the feasibility of your design with us?

Contact us and find out how to validate our microfabrication technology for your project.

Facts and figures on Quantum X

  • Key Features
  • Designed for
  • Specifications
  • Downloads
  • High-speed 2.5D microfabrication of freeform microoptics with sub-micrometer resolution
  • Ultra-smooth surfaces and excellent shape accuracy
  • Sag heights up to ≥ 1,000 µm with vertical side walls and high aspect ratios
  • Truly seamless structures with 2GL stitching and tilt compensation features
  • Wide choice of substrates and wafers up to 8” (200 mm)
  • Touchscreen and remote control interfaces
  • High mechanical and thermal stability through granite base and vibration damping
  • Complete solutions including printing material and process parameters

Designed for industrial tasks in

  • Refractive microoptics – individual lenses and arrays, freeform and Fresnel
  • Multi-level diffractive optical elements – with discrete levels or quasi-continuous
  • Rapid prototyping of 2.5D microoptics
  • Master templates for replication processes, e.g. nanoimprint lithography (NIL) and microinjection molding
  • Wafer-scale fabrication

Benchmark scores

Surface roughness (Ra) down to ≤ 5 nm
Feature size control 1 down to 100 nm
Shape accuracy (Sa) down to ≤ 200 nm
Stitching-free part diameter up to 1,750 µm
Maximum scan speed 2 6.25 m/s divided by lens magnification
Microlens array print throughput 20 mm²/h for 100 µm height

General system properties

Printing technology

Two-Photon Grayscale Lithography (2GL ®) with voxel tuning capability
Upright platform with Dip-in Laser Lithography (DiLL)


Microscope slides (3” x 1” / 76 x 26 mm2)
Wafers from 1” to 8” (25.4 mm to 200 mm)
Glass, silicon, and further transparent and opaque materials


Nanoscribe IP/ IPX Photoresins (polymer printing)
Nanoscribe GP-Silica (glass printing)
Open to third-party or custom materials

Maximum print area 50 x 50 mm²

Given Peak values, only achieved under specific conditions such as printing parameters, print heads, photoresins and designs.
1 100 nm feature size control in x/y direction

Prof. Dr. Harald Giessen, University of Stuttgart

Prof. Dr. Harald Giessen, University of Stuttgart
My first print job worked flawlessly and the structure is stunningly good, if not to say sensational. I have never seen anything like this before.

Quantum X Software
How to get started with your print job

Prepare and control your print job via touchscreen or remotely

The simple and convenient workflow makes it easy to integrate Quantum X into industrial manufacturing environments and multi-user scenarios. What makes it so simple? You can upload, print, and monitor your print job directly from the device’s touchscreen or remotely from your PC. And these are just some of the reasons to connect with Nanoscribe Quantum X.

Generate your print job with GrayScribeX: In just a few steps, the print job development software guides you from creation to uploading your individual project as a proprietary .nano file to the maskless lithography system Quantum X.

Start your print job via the touchscreen: The intuitive touchscreen menu of Quantum X easily guides you to successful printing. Also benefit from essential data such as hardware information, system status and the print progress. Furthermore, a live view of the print process via three cameras gives you a visual control at any time.

Stay connected with nanoConnectX: Start and monitor your print job from the office with the remote access software nanoConnectX. The Quantum X system is therefore well equipped for industrial manufacturing environments and multi-user scenarios.

Software facts

  • GrayScribeX
  • Touchscreen
  • nanoConnectX

GrayScribeX is a specially developed software for creating individual print jobs for Quantum X. You can import standard grayscale images or CAD models that are automatically converted into grayscale images. A smart software routine translates the gray values from the imported design into the heights of the print object and precisely sets the calibrated print parameters.

Key feature Benefits
Import of 16 bit grayscale images and CAD files Use standard image files .bmp and .png as well as the CAD format .stl
Remote upload of print jobs  Work and connect remotely with Quantum X from the office
Add, remove and duplicate structures to the print job  Create print jobs of different structures in one file
Rescale your structures and create arrays Modify the structures to meet individual requirements for the corresponding application
Field-proven print parameter presets Benefit from ready-to-use preset parameters for straightforward printing of any grayscale design
Internal calibration files Easily translate your gray values into the corresponding writing parameter
.nano files Take advantage of the container file   format that includes all necessary information for data exchange and a successful print in a single file

Control and monitor the Two-Photon Grayscale Lithography system using the Quantum X front panel touch screen, the graphical user interface (GUI). It guides you to a successful print in just a few steps. Select your print project, then load your substrate and print.

Key feature Benefits
Three live cameras  Monitor the printing process online from three perspectives and always be up to date on the current status of your print job
Stage control in x, y and z direction   Move the stage to any position on the substrate to define your print area
User-friendly print setup Select resin and substrate, and start the print job with just one click
Project list Keep track of the entire print job history
Automatic interface finder Identify the interface of the substrate with submicrometer accuracy

nanoConnectX is the remote access software for the Quantum X system. It brings all the functions and display capabilities of the touchscreen to any computer connected online.

Key feature Benefits
Remote access to the system Connect Quantum X to your computer, no matter where you are
Use all features of the touchscreen Prepare, control and monitor your print jobs from any location
Upload and download print jobs and reports Direct access from your computer towards print related files

Quantum X
Redefining microfabrication.

Mastering success.

We would be pleased to prepare a customized offer for you.
For this, please clarify the details with our sales experts.

Nanoscribe's Quantum X system
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