November 09, 2021

Nanoscribe presents
new Quantum X product line at Formnext 2021

Wafers with mechanical components
Fascinating advances in wafer-scale batch processing: At the last Formnext in 2019, visitors gained insights into the small series production of millimeter-sized elements on wafers up to 2’’. With the new Quantum X shape, precision and speed are significantly increased and small series production is now possible on wafers up to 6’’.

Nanoscribe, a BICO company, will present its key innovations at Formnext 2021 in Frankfurt, Germany next week. At the leading additive manufacturing conference and trade fair, Nanoscribe will debut its recently expanded, industry-proven Quantum X platform to a wide audience. The new Quantum X shape will also be featured in demo sessions at the booth. Additionally, Nanoscribe will outline advances in microfabrication with a focus on rapid prototyping, wafer-scale batch processing, and mastering as well as replication capabilities through nanoimprint lithography (NIL) and injection molding (IM), also in joint talks with specialized partners at the Nanoscribe booth (hall 12.1, G61).

During the conference, Nanoscribe will showcase its extended, industry-proven Quantum X platform for the first time. With the new Quantum X shape, the world leader for Two-Photon Polymerization (2PP) based 3D printing systems now offers microfabrication capabilities for virtually any design from 2D to 3D in one device. As the second microfabrication system in the industry-proven Quantum X platform, Quantum X shape enables the fastest and most accurate, high-precision 3D printing in class. The printer stands alongside the world’s first Two-Photon Grayscale Lithography (2GL ®) system Quantum X for microoptics and surface patterning. In addition, two new classes of materials have been added to Nanoscribe’s photoresin portfolio this year. Thus, the innovative potential in microfabrication is also growing with dedicated solutions for specific needs in different industries and application fields.

Insights into wafer-scale batch processing with Nanoscribe Quantum X shape

Nanoscribe Quantum X shape increases the capabilities and performance of wafer-scale microfabrication. The high-precision 3D printing system can print on a wide range of substrate types and formats, including silica and silicon wafers up to 6”. Unlike most 2PP systems, Quantum X shape prints in an upright position. Combined with the proprietary photoresin dispenser, this feature ensures precise dosing of the printing material throughout the entire printing process and even on large areas. Thus, up to 200 typical structures can be printed overnight on a fully addressable print field of 50 x 50 mm² on substrates such as wafers and microscope slides made of silicon, glass and other transparent or opaque materials. Further insights into the workflow and printing process with the Quantum X shape will be provided in demo sessions at the Nanoscribe booth.

Piloted process chain for microoptics mastering and replication by NIL and IM

Nanoscribe’s proprietary Two-Photon Grayscale Lithography (2GL ®) significantly speeds up the high-precision microfabrication of 2.5D structures for optical applications, such as prototyping or mastering of freeform microoptics, microlens arrays, and multilevel diffractive optical elements with the highest shape accuracy and optical-grade surfaces (Ra ≤ 5 nm). To scale up production even further, combining 2GL mastering with replication technologies comes into play. With nanoimprint lithography (NIL) and injection molding (IM), Nanoscribe has already piloted two reliable and proven replication strategies. As a highlight, the program at the Nanoscribe booth includes joint presentations with EV Group and kdg Opticomp, explaining both replication approaches and the process chain starting with Quantum X manufactured microoptics in more detail. The aim of the talks is to outline the short design iteration cycles of the 2GL additive manufacturing process, which allow masters for replication to be produced within a few days, thus moving microoptics manufacturing into mass production.

Three classes of printing materials for various applications

Advances in microfabrication are closely linked to printing materials. This year, Nanoscribe expanded its photoresin portfolio from polymer-based IP photoresins to include a new silica nanocomposite for 3D printing fused silica microstructures and Xpect Inx Photoresins for 3D printing biomaterials.

The new GP-Silica, developed in collaboration with the German company Glassomer, enables 3D printing of glass with micrometer precision. Thanks to an optical transmission window that extends from the UV to the infrared region combined with thermal, mechanical and chemical stability, the new material is also suitable for applications in life sciences, microfluidics, microreactors or microoptics. The new Xpect Inx N100 series, which consists of three hydrogels and biodegradable photoresins for Nanoscribe systems, advances 3D biomaterial printing in life sciences, e.g. with applications in tissue engineering and cell cultivation.

Meet us at Formnext for insights into 3D printing from nano to macro

At Formnext (hall 12.1, booth G61), Nanoscribe will showcase samples of mechanical components and refractive microoptics masters fabricated with Quantum X systems, as well as the corresponding replicas of EV Group with nanoimprint lithography and kdg Opticomp with injection molding. Demo sessions will provide an overview of the lean and user-friendly workflow of the new Quantum X shape. The booth will also feature a Lumen X+™ printer from the BICO company CELLINK to provide even more hands-on insights into 3D printing for life science applications. The DLP-based 3D printer is suited for a wide range of photoresins and for bioprinting. We are looking forward to your visit.

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