Discover IPX Photoresins for Quantum X systems
The new IPX Photoresins have been specifically designed for Nanoscribe Quantum X systems. The industry-proven platform offers high-precision 3D printing and the innovative Two-Photon Grayscale Lithography technology for 2.5D microfabrication. To benefit from the printing speed, precision and performance of the Quantum X platform, the new IPX photoresin series of photopolymer printing materials has been developed for different structure qualities and processes. IPX-S and IPX-Q are designed for printing mesoscale structures with micrometer precision using Two-Photon Grayscale Lithography and Two-Photon Polymerization correspondingly.
Key Features of IPX-S
- Rapid 2GL-based 2.5D Microfabrication using GrayScribeX
- Designed for printing with the Quantum X platform
- Printing up to millimeter-scale optics – using the Large Feature Print Set
- Full design freedom for 2.5D structures
- Optical-grade surfaces with roughness down to 10 nm Ra
- Excellent shape accuracy
Key Features of IPX-Q
- Rapid 2PP-based 3D Microfabrication using DeScribeX
- Designed for printing with the Quantum X platform
- Printing up to millimeter-sized 3D objects – using the Large Feature Print Set
- Full design freedom for 3D structures
- High aspect ratios
- Excellent shape accuracy
Are you looking for
further high-precision printing materials?
Nanoscribe’s IP Photoresins are proven printing materials for high-precision 3D Microfabrication by Two-Photon Polymerization (2PP). The product line presents a broad range of negative-tone, (meth)acrylate-based resins designed for nano-, micro-, and mesoscale structures.